Filling a gap in the literature for a focus on industrial photochemical processes and applications, this textbook also discusses the changes to equipment if process chemists and engineers use light and radiation in their production processes. The author team combines industrial and academic expertise, providing the knowledge vital to chemists, engineers, material scientists and biologists working in the field.

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Bernd Strehmel is working in Research and Development at Kodak Graphic Communications GmbH in Germany. Having obtained his academic doctoral degree from the former Technical University of Merseburg, he took several research appointments at the Technical University of Berlin, Stanford University, Humboldt University, Center for Photochemical Sciences at Bowling Green State University, and Potsdam University before he started his industrial work at Kodak in Germany. He finished his habilitation in Physical Chemistry at Humboldt University in 2003, and has taught Industrial Photochemistry since 2005. He has been the author of several peer-reviewed publications, review articles, and patents. Veronika Strehmel is working in the Institute of Chemistry at Potsdam University in Germany. Having obtained her academic doctoral degree from the former Technical University of Merseburg, she took research appointments at Stanford University and Martin-Luther University Halle-Wittenberg before she has continued her academic carrier at Potsdam University in 2001. She also finished her habilitation in Macromolecular Chemistry 2000 and has taught applied aspects of polymer chemistry emphasizing on photopolymerization and ionic liquids. She has been the author of several peer-reviewed publications, review articles, and patents. John Malpert has worked for the past decade at Spectra Group Limited (SGL) in Millbury, Ohio. SGL is small research and development company that specializes in bringing photochemistry to the market place with products ranging from UV/vis formulation products, color-on-demand products and visible and UV/visible patented photoinitiators. John is a native of North Dakota, obtaining his undergraduate degree from the University of North Dakota in 1991. He then went on to Iowa State University where he obtained his Ph.D. in the field of synthetic organic chemistry, specializing in using photochemistry to affect chemical transformations. He then went on to pursue his post-doctoral studies at the Center for Photochemical Sciences at Bowling Green State University. He has been the author of several publications and patents.

1 Introduction to Applied and Industrial Photochemistry 2 Photochemical and Photophysical Processes and Their Function in Industrial Applications 2.1 Use of Optical Irradiation for Photochemistry in Applied and Industrial Processes 2.1.1 Availability of Optical Irradiation 2.1.2 Optical Irradiation for Applied and Industrial Photoprocesses 2.1.3 Absorption Law under Industrial Exposure Conditions 2.1.4 Scattering in Photochemical Industrial Manufacturing 2.2 Photophysical Primary Processes in Applied and Industrial Processes 2.2.1 General Remarks about Photophysical Processes in Industrial Applications 2.2.2 Linear Absorption 2.2.3 Nonlinear Absorption 2.2.4 Triplet States 2.2.5 Nonradiative Deactivation 2.2.6 Radiative Deactivation 2.2.7 Excimers and Exciplexes 2.2.8 Energy Transfer and Spectral Sensitization 2.2.9 Dimers, Trimers and Aggregates 2.3 Photochemical Reactions in Applied and Industrial Processes 2.3.1 General Remarks about Photochemical Reactions in Industrial Applications 2.3.2 Photofragmentation 2.3.3 Photoinduced Electron Transfer and Spectral Sensitization 2.3.4 Photocycloaddition 2.3.5 Photochromism 2.3.6 Singlet Oxygen 2.3.7 Chemiluminescence 2.3.8 Photoconductivity 2.3.9 Photoinhibition/Photostabilization 3 Light sources 3.1 Conventional Light Sources 3.2 Laser 3.3 Light Emitting Diode 3.4 Solar Energy 4 Photoinduced Synthesis from a Technological Point of View 4.1 Exposure Condition in Homogeneous and Heterogeneous Systems 4.1.1 Photochemistry in Batch Reactors 4.1.2 Photochemistry in Thin-Layer Reactors 4.1.3 Exposure of Thin Films 4.1.4 Photochemistry in Microreactors 4.2 Industrial Applications 4.2.1 Photohalogenation 4.2.2 Photonitrosation 4.2.3 Photosulfochlorination and Photosulphoxidation 4.2.4 Photooxidation 4.2.5 Photochemical Ring Opening 5 Photopolymers 5.1 Direct Photocrosslinking 5.1.1 General Principle 5.1.2 Industrial Importance 5.2 Radical Photopolymerization 5.2.1 General Principle 5.2.2 Photoinitiators 5.2.3 Monomers 5.2.4 Additives and Fillers 5.2.5 Characterization of Photopolymers 5.2.6 Applied and Industrial Applications of Photopolymers 5.3 Cationic Photopolymerization 5.3.1 General Principle 5.3.2 Photoinitiators 5.3.3 Monomers 5.3.4 Additives and Fillers 5.3.5 Characterization of Photopolymers 5.3.6 Applied and Industrial Applications of Photopolymers 5.3.7 Hybrid Systems 5.4 Base Catalyzed Induced Photopolymerization 5.4.1 General Principle 5.4.2 Photoinitiatores 5.4.3 Monomers 5.4.4 Additives and Fillers 5.4.5 Characterization of Photopolymers 5.4.6 Applied and Industrial Applications of Photopolymers 5.4.7 Hybrid Systems 6 Information Recording and Information Storage 6.1 Exposure Techniques 6.1.1 Mask Techniques 6.1.2 Mask-less Techniques and Digital Exposure 6.2 Characterization of Information Recording Systems 6.2.1 Gradation 6.2.2 Modulation Transfer Function 6.2.3 Spatial Resolution 6.3 Information Recording Systems Based on Silver Halides 6.3.1 Photographic Process 6.3.2 Black and White Photography 6.3.3 Color Photography 6.3.4 Manufacturing of Information Recording Materials based on Silver Halide Systems 6.3.5 Applied and Industrial Applications 6.4 Information Systems without Silver Halides 6.4.1 Diazo Systems 6.4.2 Azide Systems 6.4.3 Autogene Systems 6.4.4 Photopolymers 6.4.5 Applied and Industrial Applications 6.5 Optical Data Storage 6.5.1 Holography 6.5.2 Prerecorded Optical Data Storage Media 6.5.3 Recordable Optical Data Storage Media 6.5.4 Rewritable Optical Data Storage Media 6.5.5 Magneto-optical Data Storage Media 6.5.6 Applied and Industrial Applications 7 Lithography 7.1 Characterization of Photolithographic Systems 7.2 Etching 7.3 Ablation 7.4 Macrolithography 7.5 Microlithography and Stereolithography 7.6 Nanolithography 7.7 Applied and Industrial Applications 8 Organic Light Emitting Diodes (OLEDs) 8.1 General Principle and Construction of OLEDs 8.1.1 One-Layer OLED 8.1.2 Multi-Layer OLED 8.1.3 Quantification of Photophysical and Photochemical Processes 8.2 Materials 8.2.1 Electrode Materials 8.2.2 Emitter Materials 8.2.3 Hole Transporting Materials 8.2.4 Encapsulation Materials 8.3 Industrial Applications and Future Trends 9 Conversion and Storage of Solar Energy 9.1 Principles 9.1.1 Conversion into Heat 9.1.2 Conversion into Chemical Energy 9.1.3 Conversion into Electrical Energy 9.2 Construction of Solar Cells 9.2.1 Inorganic Systems 9.2.2 Organic Systems 9.3 Reliability and Future Trends 10 Other Applications 10.1 Photodynamic Therapy 10.2 Photochemistry in Forensic Sciences 10.3 Optical Filters 10.4 Optical Brightener 10.5 Green Photochemistry 11 Appendix 11.1 Units 11.2 Conversions